We are producing electronic beam evaporators
for depositing thin films.
The evaporator consists of an deposition-
and an electron beam chamber and an automatic
pumping station.
The diameter of the evaporation chamber is
280 mm. Only the evaporation chamber is vented
when changing the sample. When taking the
sample, the e-gun chamber and the evaporation
sources are being held in vacuum. Therefore
there is no risk for contamination. The pumping
time to 10-6mbar after changing the sample
takes less than 5 minutes. The evaporation
chamber is isolated with a 200 mm gate valve.
The substrate holder can be ordered in many
different configurations.
The diameter of the electronic beam chamber
is 350 mm. The electronic beam evaporator
with 1-8 crucibels is fixed in the chamber
with a NW200 flange. This gun can be lifted
out for cleaning. The evaporator is equipped
with several windows to check the crusibels,
beam or the gun. The beam and the emission
can be regulated with a remote control. The
electron beam evaporator chamber is being
vacuumed only if the gun is in need of service
or if evaporation material needs to be added.
